Fabrication of Poly(9,9'-dioctylfluorene)-Based Nano- and Microstructures by Proton Beam Writing
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概要
- 論文の詳細を見る
A new and direct nano-microprocessing technique for poly(9,9'-dioctylfluorene) (PFO) films using proton beam writing (PBW) based on the cross-linking reaction of the polymer without a cross-linking agent was proposed. Not only the surface morphology but also structure size and shape on PFO films can be controlled from the nanometer to micrometer scale by adjusting the fluence of incident protons. Fabrication of three-dimensional PFO structures with an aspect ratio of 12 was successfully demonstrated by PBW with the adjustment of fluence at 3.5\times 10^{6} ions/μm2.
- 2012-04-25
著者
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Seki Shu
Department Of Applied Chemistry Graduate School Of Engineering Osaka University
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Asano Atsushi
Department Of Applied Chemistry National Defense Academy
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Nishikawa Hiroyuki
Department Of Breast And Endocrine Surgery St. Marianna University School Of Medicine
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Saeki Akinori
Department Of Applied Chemistry Graduate School Of Engineering Osaka University
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Ishii Yasuyuki
Department Of Animal And Grassland Science Faculty Of Agriculture University Of Miyazaki
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Kamiya Tomihiro
Department of Advanced Radiation Technology, TIARA, JAEA, Takasaki, Gunma 370-1292, Japan
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Satoh Takahiro
Department of Advanced Radiation Technology, TIARA, JAEA, Takasaki, Gunma 370-1292, Japan
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Maeyoshi Yuta
Department of Applied Chemistry, Graduate School of Engineering, Osaka University, Suita, Osaka 565-0871, Japan
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Takano Katsuyoshi
Department of Applied Chemistry, Graduate School of Engineering, Osaka University, Suita, Osaka 565-0871, Japan
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Marui Hiromi
Department of Applied Chemistry, Graduate School of Engineering, Osaka University, Suita, Osaka 565-0871, Japan
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Omichi Masaaki
Department of Applied Chemistry, Graduate School of Engineering, Osaka University, Suita, Osaka 565-0871, Japan
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Ohkubo Takeru
Department of Advanced Radiation Technology, TIARA, JAEA, Takasaki, Gunma 370-1292, Japan
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Koka Masashi
Department of Advanced Radiation Technology, TIARA, JAEA, Takasaki, Gunma 370-1292, Japan
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Kada Wataru
Department of Advanced Radiation Technology, TIARA, JAEA, Takasaki, Gunma 370-1292, Japan
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Sugimoto Masaki
Department of Advanced Radiation Technology, TIARA, JAEA, Takasaki, Gunma 370-1292, Japan
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Nishikawa Hiroyuki
Department of Applied Physics and Chemistry, The University of Electro-Communications, Chofu, Tokyo 182-8585, Japan
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Nishikawa Hiroyuki
Department of Electrical Engineering, Shibaura Institute of Technology, Koto, Tokyo 135-8548, Japan
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Seki Shu
Department of Applied Chemistry, Graduate School of Engineering, Osaka University, Suita, Osaka 565-0871, Japan
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Saeki Akinori
Department of Applied Chemistry, Graduate School of Engineering, Osaka University, Suita, Osaka 565-0871, Japan
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Asano Atsushi
Department of Applied Chemistry, Graduate School of Engineering, Osaka University, Suita, Osaka 565-0871, Japan
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Ishii Yasuyuki
Department of Advanced Radiation Technology, TIARA, JAEA, Takasaki, Gunma 370-1292, Japan
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