Analysis and Improvement of Retention Time of Memorized State of Metal-Ferroelectric-Insulator-Semiconductor Structure for Ferroelectric Gate FET Memory
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概要
- 論文の詳細を見る
Retention characteristics of metal-ferroelectric-insulator-semiconductor (MFIS) structures have been studied theoretically by considering effects of charge injections derived from the difference between leakage current densities in the ferroelectric and insulator layers. The calculated curves for time-dependent capacitance have shown good agreements with experimental results. The numerical results for the MFIS structure have indicated that excess current over a certain value through the ferroelectric and the insulator layers causes the retention time to rapidly degrade. An idea of inserting an insulator film between the metal and the ferroelectric layers in an MFIS has also been examined in order to cut down the currents through the ferroelectric layer. The calculations based on our model have found this metal-insulator-ferroelectric-insulator-semiconductor (M-I-FIS) structure to exhibit much longer retention time than the conventional MFIS@.
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 2001-04-30
著者
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Noda Minoru
Area Of Materials And Device Physics Department Of Physical Science Graduate School Of Engineering S
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Takahashi Mitsue
Area Of Materials And Device Physics Department Of Physical Science Graduate School Of Engineering S
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Kodama Kazushi
Area Of Materials And Device Physics Department Of Physical Science Graduate School Of Engineering S
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SUGIYAMA Hideki
Area of Materials and Device Physics, Department of Physical Science, Graduate School of Engineering
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Nakaiso Toshiyuki
Area Of Materials And Device Physics Department Of Physical Science Graduate School Of Engineering S
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Okuyama Masanori
Area of Materials and Device Physics, Department of Physical Science, Graduate School of Engineering Science, Osaka University, 1-3 Machikaneyama-Cho, Toyonaka City, Osaka 560-8531, Japan
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Okuyama Masanori
Area of Advanced Electronics and Optical Science, Department of Systems Innovation, Graduate School of Engineering Science, Osaka University, 1-3 Machikaneyama-cho, Toyonaka, Osaka 560-8531, Japan
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Nakaiso Toshiyuki
Area of Materials and Device Physics, Department of Physical Science, Graduate School of Engineering Science, Osaka University, 1-3 Machikaneyama-Cho, Toyonaka City, Osaka 560-8531, Japan
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Sugiyama Hideki
Area of Materials and Device Physics, Department of Physical Science, Graduate School of Engineering Science, Osaka University, 1-3 Machikaneyama-Cho, Toyonaka City, Osaka 560-8531, Japan
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Takahashi Mitsue
Area of Materials and Device Physics, Department of Physical Science, Graduate School of Engineering Science, Osaka University, 1-3 Machikaneyama-Cho, Toyonaka City, Osaka 560-8531, Japan
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Noda Minoru
Area of Materials and Device Physics, Department of Physical Science, Graduate School of Engineering Science, Osaka University, 1-3 Machikaneyama-Cho, Toyonaka City, Osaka 560-8531, Japan
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Kodama Kazushi
Area of Materials and Device Physics, Department of Physical Science, Graduate School of Engineering Science, Osaka University, 1-3 Machikaneyama-Cho, Toyonaka City, Osaka 560-8531, Japan
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