ナノスケールダマシン銅配線のアニーリングによる構造変化
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概要
- 論文の詳細を見る
The high-resolution electron backscatter diffraction (EBSD) technique was applied to study microstructure and texture changes in the overburden layer as well as in upper and bottom parts of nano-scale damascene copper lines during annealing in a temperature range of 200–500°C. The microstructure in overburden layer was found to coarsen significantly at 200°C. At higher temperatures, however, it was established that the overburden layer and both parts of the lines were surprisingly stable. It was also shown that the microstructure in all studied regions was stabilized after achieving the same level of total grain-boundary area per unit volume. This observation has been interpreted as indirect evidence that grain growth behavior in the lines was governed by the pinning effect of second-phase particles entrapped during the electrodeposition process.
- 公益社団法人 電気化学会の論文
著者
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Onuki Jin
Department Of Electronic And Information Systems Faculty Of Systems Science And Technology Akita Pre
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MIRONOV Sergey
Department of Materials Processing, Graduate School of Engineering, Tohoku University
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KE Yiqing
Graduate School of Science and Engineering, Ibaraki University
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KONKOVA Tatyana
Department of Materials Science and Engineering, Ibaraki University
関連論文
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- PREFACE
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- Void Generation Mechanism in Cu Filling Process by Electroplating for Ultra Fine Wire Trenches
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- Influence of Minimum Barrier Metal Thickness at Trenches on Void Formation in 50-nm-wide Cu Wiring
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