白金酸化物薄膜の光学的特性と電子状態

概要

論文の詳細を見る
Electronic structures of platinum oxide thin films on fused silica substrate which were prepared by rf magnetron reactive sputtering in argon and oxygen mixture gases were investigated by measuring photo absorption spectra up to VUV region and XPS spectra in range of valence band. Analyzing the result of RBS, XPS and XRD, it was found that the thin films were composed of α-PtO_2 or mixture of α-PtO_2 and PtO, and specific structures of each oxides were observed in the photo absorption spectra. Mostly two peaks were obtained in XPS spectra below 12eV of binding energy. The peak obtained at higher binding energy was weaker as increasing PtO/α-PtO_2 ratio. It seems that the pair of two peaks was found in the photo absorption spectra both α-PtO_2 and PtO.
明治大学の論文
2007-03-31