Stress Changes and Stability of Sputter-Deposited Mo/B_4C Multilayer Films for Extreme Ultraviolet Mirrors
スポンサーリンク
概要
- 論文の詳細を見る
- 2002-05-15
著者
-
SUGIE Yosohiro
Graduate School of Engineering, University of Hyogo
-
Sugie Y
Faculty Of Engineering Himeji Institute Of Technology
-
Niibe M
Himeji Inst. Technol. Hyogo Jpn
-
Niibe Masahito
Laboratory Of Advanced Science And Technology For Industry Himeji Institute Of Technology
-
NII Hajime
Faculty of Engineering, Himeji Institute of Technology
-
SUGIE Yosohiro
Faculty of Engineering, Himeji Institute of Technology
-
Nii Hajime
Faculty Of Engineering Himeji Institute Of Technology
-
Niibe Masahito
Laboratory of Advanced Science &Technology for Industry, Himeji Institute of Technology
関連論文
- Preparation of carbonaceous thin films by plasma-assisted chemical vapor deposition using active fluorine atoms
- Preparation of carbonaceous thin films by plasma-assisted chemical vapor deposition using active fluorine atoms (特集 気相から生成した炭素材料)
- Silylation of graphite oxide by dimethyloctylchlorosilane (小特集 炭素材料へのインターカレーシヨン)
- Hydrophilic Treatment of Carbon-coated Metal by Plasma Fluorination
- Preparation of Pillared Carbons by Pyrolysis of Silylated Graphite Oxide
- Monomeric Dispersion of Covalently Attached Pyrene Chromophores in Silylated Graphite Oxide
- Enhanced Fluorescence from Rhodamine B Intercalated into Hydrophobized Graphite Oxides Containing Perfluoroalkyl Chains
- Preparation and Fluorescent Properties of Rhodamine B-hexadecylamine-intercalated Graphite Oxide Thin Film
- Stress Changes and Stability of Sputter-Deposited Mo/B_4C Multilayer Films for Extreme Ultraviolet Mirrors
- Double-Pass Amplification in Ge Soft X-Ray Laser with a Polarizing Half-Cavity
- Contrast Measurement of Reflection Masks Fabricated from Cr and Ta Absorbers for Extreme Ultraviolet Lithography
- Normal Incidence Multilayer Mirrors for Soft X-Rays (光学薄膜特集号)
- Optical Design for Soft X-Ray Projection Lithography : X-Ray Lithography
- Optical Design for Soft X-Ray Projection Lithography
- Nonlinear behavior of decrease in reflectivity of multilayer mirrors for extreme ultraviolet lithography optics by high-flux extreme ultraviolet irradiation in various vacuum environments (Special issue: Microprocesses and nanotechnology)
- Fabrication of Aspherical Mirrors for Extreme Ultra-Violet Lithography (EUVL) Using Deposition Techniques
- A Novel Design of Three-Aspherical-Mirror Imaging Optics for Extreme Ultra-Violet Lithography
- Ion-solvent interaction for lithium-ion transfer at the interface between carbonaceous thin-film electrode and electrolyte (特集 炭素系薄膜材料の基礎から応用まで)
- Damage Characteristics of TiO2 Thin Film Surfaces Etched by Capacitively Coupled Radio Frequency Helium Plasmas
- Effect of Dielectric Barrier Discharge Air Plasma Treatment on TiO2 Thin Film Surfaces
- Electrochemistry of 2'-Anthraquinone-modified Oligonucleotide Immobilized on Gold Surface : Differential Electron Transfer Efficiency between Single and Double Helical Forms
- Cyclic Voltammetric Responses in Hybrid Formation of 2'-Anthraquinone-Modified Oligonucleotide with DNA
- A Novel Design of Three-Aspherical-Mirror Imaging Optics for Extreme Ultra-Violet Lithography
- Inhibition of Contamination of Ru-Capped Multilayer Mirrors for Extreme Ultraviolet Lithography Projection Optics by Ethanol
- New Extreme Ultraviolet Irradiation and Multilayer Evaluation System for Extreme Ultraviolet Lithography Mirror Contamination in the NewSUBARU
- Contamination Evaluation System for Extreme Ultraviolet Mirrors with the Use of Undulator Radiation
- Defect Evolution in Multiwalled Carbon Nanotube Films Irradiated by Ar Ions
- Thermal Durability of Diamond Like Carbon Films Containing Tungsten Fabricated by Focused-Ion-Beam Chemical Vapor Deposition
- Annealing Effect of W Incorporated Diamond-Like Carbon Fabricated by Ga Focused Ion Beam Chemical Vapor Deposition
- Characteristics of TiO2 Thin Film Surfaces Treated by Helium and Air Dielectric Barrier Discharge Plasmas
- Damage Analysis of Plasma-Etched n-GaN Crystal Surface by Nitrogen K Near-Edge X-ray Absorption Fine Structure Spectroscopy
- Damage Analysis of n-GaN Crystal Etched with He and N2 Plasmas
- X-ray Absorption Studies on the Growth Process of Radio-Frequency-Magnetron-Sputtered Boron Nitride Films: Effects of Bias Voltage and Substrate Temperature
- Comparison between Damage Characteristics of p- and n-GaN Surfaces Etched by Capacitively Coupled Radio Frequency Argon Plasmas (Special Issue : Dry Process)
- X-ray Absorption Studies on the Growth Process of Radio-Frequency-Magnetron-Sputtered Boron Nitride Films : Effects of Bias Voltage and Substrate Temperature