Nonlinear behavior of decrease in reflectivity of multilayer mirrors for extreme ultraviolet lithography optics by high-flux extreme ultraviolet irradiation in various vacuum environments (Special issue: Microprocesses and nanotechnology)
スポンサーリンク
概要
著者
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Kawata Shintaro
Precision Equipment Company Nikon Corporation
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Kakutani Yukinobu
Laboratory Of Advanced Science And Technology For Industry University Of Hyogo
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Niibe Masahito
Laboratory of Advanced Science &Technology for Industry, Himeji Institute of Technology
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Koida Keigo
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Kamigori, Hyogo 678-1205, Japan
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Nakayama Takahiro
Nanotechnology Development Center, Canon Inc., Utsunomiya 321-3298, Japan
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Terashima Shigeru
Nanotechnology Development Center, Canon Inc., Utsunomiya 321-3298, Japan
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Miyake Akira
Nanotechnology Development Center, Canon Inc., Utsunomiya 321-3298, Japan
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Kubo Hiroyoshi
Nanotechnology Development Center, Canon Inc., Utsunomiya 321-3298, Japan
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Matsunari Shuichi
Precision Equipment Company, Nikon Corporation, Sagamihara 228-0828, Japan
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Aoki Takashi
Precision Equipment Company, Nikon Corporation, Sagamihara 228-0828, Japan
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