New Extreme Ultraviolet Irradiation and Multilayer Evaluation System for Extreme Ultraviolet Lithography Mirror Contamination in the NewSUBARU
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概要
- 論文の詳細を見る
A new contamination evaluation system that can irradiate high-flux extreme ultraviolet (EUV) and measure, in situ, the reflectivity of multilayer mirrors for EUV lithography (EUVL) projection optics was constructed to develop a contamination inhibition mechanism at the NewSUBARU synchrotron radiation (SR) facility. The vacuum chambers of the systems are all metal sealed. All automatic stages in the system are driven by motors set outside the chambers. The optimum pressure of the chamber was $2 \times 10^{-7}$ Pa, two orders of magnitude higher than that in the system reported last year. The partial pressure of the hydrocarbon components was also two orders of magnitude smaller than that in the previously reported system. In the first experiment using the system, the lifetime of Si-capped Mo/Si multilayer mirrors was evaluated as a function of water vapor pressure. The system can also be used to measure and map X-ray absorption near-edge structure (XANES) spectra in the irradiated area, which is very important for the in situ evaluation of the contamination mechanism.
- 2006-06-30
著者
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Fukuda Yasuaki
Extreme Ultraviolet Lithography System Development Association (euva)
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MURAKAMI Katsuhiko
Extreme Ultraviolet Lithography System Development Association (EUVA), Wave Front Measurement Lab.
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Kakutani Yukinobu
Laboratory Of Advanced Science And Technology For Industry University Of Hyogo
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Niibe Masahito
Laboratory of Advanced Science &Technology for Industry, Himeji Institute of Technology
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Niibe Masahito
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Kouto, Kamigoori-cho, Ako-gun, Hyogo 678-1205, Japan
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Terashima Shigeru
Extreme Ultraviolet Lithography System Development Association (EUVA), 11th Floor, Kawasaki East One Building, 11-1 Ekimae-honcho, Kawasaki-ku, Kawasaki 210-0007, Japan
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Matsunari Shuichi
Extreme Ultraviolet Lithography System Development Association (EUVA), 11th Floor, Kawasaki East One Building, 11-1 Ekimae-honcho, Kawasaki-ku, Kawasaki 210-0007, Japan
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Aoki Takashi
Extreme Ultraviolet Lithography System Development Association (EUVA), 11th Floor, Kawasaki East One Building, 11-1 Ekimae-honcho, Kawasaki-ku, Kawasaki 210-0007, Japan
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Terashima Shigeru
Extreme Ultraviolet Lithography System Development Association (EUVA), 3-23 Kanda Nishiki-cho, Chiyoda-ku, Tokyo 101-0054, Japan
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Matsunari Shuichi
Extreme Ultraviolet Lithography System Development Association (EUVA), 3-23 Kanda Nishiki-cho, Chiyoda-ku, Tokyo 101-0054, Japan
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Takase Hiromitu
Extreme Ultraviolet Lithography System Development Association (EUVA), 3-23 Kanda Nishiki-cho, Chiyoda-ku, Tokyo 101-0054, Japan
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Gomei Yoshio
Extreme Ultraviolet Lithography System Development Association (EUVA), 3-23 Kanda Nishiki-cho, Chiyoda-ku, Tokyo 101-0054, Japan
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Kakutani Yukinobu
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Kouto, Kamigoori-cho, Ako-gun, Hyogo 678-1205, Japan
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Fukuda Yasuaki
Extreme Ultraviolet Lithography System Development Association (EUVA), 3-23 Kanda Nishiki-cho, Chiyoda-ku, Tokyo 101-0054, Japan
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Murakami Katsuhiko
Extreme Ultraviolet Lithography System Development Association (EUVA), 3-23 Kanda Nishiki-cho, Chiyoda-ku, Tokyo 101-0054, Japan
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Murakami Katsuhiko
Extreme Ultraviolet Lithography System Development Association (EUVA), 11th Floor, Kawasaki East One Building, 11-1 Ekimae-honcho, Kawasaki-ku, Kawasaki 210-0007, Japan
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