Niibe M | Himeji Inst. Technol. Hyogo Jpn
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概要
関連著者
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Niibe M
Himeji Inst. Technol. Hyogo Jpn
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Niibe Masahito
Himeji Institute Of Technology Laboratory Of Advanced Science And Technology For Industry
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Fukuda Yukio
Texas Instruments Tukuba Research & Development Center Limited
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Fukuda Y
Ntt Optoelectronics Laboratories
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Fukuda Yukio
Tsukuba Research And Development Center Texas Instruments Japan Limited
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Niibe Masahito
Laboratory Of Advanced Science And Technology For Industry Himeji Institute Of Technology
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Fukuda Yuji
Kansai Photon Science Institute Japan Atomic Energy Agency
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Fukuda Yuji
JAEA
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Niibe Masahito
Laboratory of Advanced Science &Technology for Industry, Himeji Institute of Technology
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渡部 行男
九大院理
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渡辺 征夫
九州大学
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Komano H
Tokyo Ohka Kogyo Co. Ltd. Kanagawa Jpn
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FUKUDA Yasuaki
Canon Research Center
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Watanabe Toshihide
Atr Adaptive Communications Research Laboratories:(present Address)nhk Science And Technical Researc
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Watanabe T
Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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KINOSHITA Hiroo
Laboratory of Advanced Science and Technology for Industry, Himeji Institute of Technology
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WATANABE Takeo
Laboratory of Advanced Science and Technology for Industry, Himeji Institute of Technology
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Watanabe T
Laboratory Of Advanced Science And Technology For Industry University Of Hyogo
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Watanabe Takeo
Univ. Hyogo Hyogo Jpn
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Kinoshita H
Laboratory Of Advanced Science And Technology For Industry University Of Hyogo
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Kinoshita Hiroo
Laboratory Of Advanced Science And Technology For Industry Himeji Institute Of Technology
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Watanabe Takeo
Laboratory Of Advanced Science And Technology For Industry University Of Hyogo
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Watanabe Takayuki
Department of Innovative and Engineered Materials, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology
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福由 祐仁
原子力機構
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Watanabe Yoshihide
Toyota Central Research And Development Laboratories Inc.
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Suzuki M
Shizuoka Univ. Hamamatsu
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NIIBE Masahito
Canon Research Center
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MIYAKE Akira
Canon Research Center
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TSUKAMOTO Masami
Canon Research Center
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Suzuki Mariko
Advanced Semiconductor Devices Research Laboratories R&d Center Toshiba Corporation
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Miyake A
Shizuoka Univ. Hamamatsu Jpn
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WATANABE Yutaka
Canon Inc., Nanotechnology Research Center
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MOCHIZUKI Noritaka
Cannon Research Center
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Suzuki M
Department Of Electronics Graduate School Of Engineering Tohoku University
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Tsukamoto Masami
Canon Inc. Nanotechnology Research Center
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MIYAKE Akira
Canon Inc., Nanotechnology Research Center
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加藤 義章
原子力機構・関西・光医療セ
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村井 健介
大工研
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KATO Yoshiaki
Institute of Laser Engineering, Osaka University
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MURAI Kensuke
Institute of Laser Engineering, Osaka University
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Neely D.
クイーンズ大
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SUGIE Yosohiro
Graduate School of Engineering, University of Hyogo
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衰 鋼
中国上海高出レーザー物理研
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Gu Y.
National Laboratory Of High Power Laser Physics
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DAIDO Hiroyuki
Institute of Applied Physics and Computational Mathematics
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Macphee Andrew
Institute Of Laser Engineering Osaka University
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衰 鋼
National Laboratory Of High Power Laser Physics
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福田 祐仁
日本原子力研究開発機構 関西光科学研究所
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Neely David
Deparment Of Pure And Applied Physics The Queen's University Of Belfast
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Murai K
Osaka National Res. Inst. Osaka Jpn
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Murai Kensuke
Institute Of Laser Engineering Osaka University
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Daido H
Japan Atomic Energy Res. Inst. Kyoto Jpn
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Daido Hiroyuki
Advanced Photon Research Center And Photo-medical Research Center Japan Atomic Energy Agency
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YUAN Gang
Institute of Laser Engineering, Osaka University
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KODAMA Ryosuke
Institute of Laser Engineering, Osaka University
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Sugie Y
Faculty Of Engineering Himeji Institute Of Technology
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Kato Yoshiaki
Advanced Photon Research Center Kansai Research Establishment Japan Atomic Energy Research Institute
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Murai K
Department Earth And Space Science Graduate School Of Science Osaka University
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Yuan G
Univ. Hawaii Hi Usa
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Kodama Ryosuke
Institute Of Laser Engineering Osaka University
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OGURA Shigetaro
Kobe Design University, Visual Communication Design
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IIZUKA Takashi
Canon Inc., Nanotechnology Research Center
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WATANABE Yutaka
Cannon Research Center
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SUZUKI Masayuki
Cannon Research Center
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NIIBE Masahito
Cannon Research Center
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FUKUDA Yasuaki
Cannon Research Center
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Ogura S
Kobe Design University Visual Communication Design
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Ogura Shigetaro
Kobe Design University
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SUZUKI Masayuki
Canon Research Center
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MOCHIZUKI Noritaka
Canon Research Center
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Nii H
Himeji Inst. Technol. Hyogo Jpn
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NII Hajime
Laboratory of Advanced Science &Technology for Industry, Himeji Institute of Technology
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TANAKA Takeshi
Laboratory of Advanced Science &Technology for Industry, Himeji Institute of Technology
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MASHIMA Kiyoto
Optical Designing Headquarters, R&D Dept., Nikon Corporation
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Yuan Gang
Institute Of Laser Engineering Osaka University
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NII Hajime
Faculty of Engineering, Himeji Institute of Technology
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SUGIE Yosohiro
Faculty of Engineering, Himeji Institute of Technology
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Nii Hajime
Faculty Of Engineering Himeji Institute Of Technology
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Mashima Kiyoto
Optical Designing Headquarters R&d Dept. Nikon Corporation
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Kato Yoshiaki
Institute Of Laser Engineering Osaka Univeristy
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Iizuka Takashi
Canon Inc. Nanotechnology Research Center
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Tanaka Takeshi
Laboratory Of Advanced Science &technology For Industry Himeji Institute Of Technology
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Ogura Shigetaro
Himeji Institute of Technology, Laboratory of Advanced Science and Technology for Industry
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新部 正人
Kobe Design University, Visual Communication Design
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塚本 雅美
Canon Inc., Nanotechnology Research Center
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Daido Hiroyuki
Institute for Chemical Research, Kyoto University, Gokasho, Uji, Kyoto 611-0011, Japan
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Nii Hajime
Laboratory of Advanced Science &Technology for Industry, Himeji Institute of Technology
著作論文
- Stress Changes and Stability of Sputter-Deposited Mo/B_4C Multilayer Films for Extreme Ultraviolet Mirrors
- Double-Pass Amplification in Ge Soft X-Ray Laser with a Polarizing Half-Cavity
- Contrast Measurement of Reflection Masks Fabricated from Cr and Ta Absorbers for Extreme Ultraviolet Lithography
- Normal Incidence Multilayer Mirrors for Soft X-Rays (光学薄膜特集号)
- Optical Design for Soft X-Ray Projection Lithography : X-Ray Lithography
- Optical Design for Soft X-Ray Projection Lithography
- Fabrication of Aspherical Mirrors for Extreme Ultra-Violet Lithography (EUVL) Using Deposition Techniques
- A Novel Design of Three-Aspherical-Mirror Imaging Optics for Extreme Ultra-Violet Lithography