20302 マイクロTAS用の触媒担持技術(OS14 機能性マイクロデバイスの創製・評価)

概要

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We have proposed a catalyst fabrication process which using ion implantation and surface etching (IISE), apply to the micro chemical system like micro total analysis system (μ-TAS). IISE can use the advantages of ion implantation, which are select ability of ion species and area, and control ability. Because, it is possible to support many kind of catalysts on each devices as the need arises. In this paper, we try to compare a different of ion energy of 3MeV and 75keV, which relate to a ion distribution of depth. A result, a case of 75keV ion implantation make a larger nano-particles than 3MeV, and the number of particles are smaller. This is similar to the lower dose case of 3MeV. Though, it seems that the KOH solution was etched over the shallow implanted layer and implanted seeds ions are released to the solution.
社団法人日本機械学会の論文
2005-03-17