Deposition of Thin Calcium Phosphate Film onto Titanium Using RF Magnetron Sputtering Technique

概要

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In the present study, we aimed to deposit thin calcium phosphate film onto titanium substrate using magnetron sputtering method. The hydroxyapatite target and tricalcium phosphate target were prepared by cold isostatic pressing method. When hydroxyapatite target was used, the crack was formed on the target material during the sputtering. The film thickness was increased according to the increase of the coating time. Heating the titanium substrate around 250℃ produced tighter bonding between coated film and titanium, and also increased film thickness compared with no-heating of the titanium. After a 5-hr coating process, the thickness of the deposited film was approximately 0.10μm when titanium substrate was heated. EPMA and FT-IR-RAS measurement reveled that the main component of coated film was calcium phosphate material. In conclusions, thin calcium phosphate film was deposited onto titanium using magnetron sputtering method.
日本再生歯科医学会の論文
2004-03-30