512 トライボナノリソグラフィーと化学エッチングを併用した極微細構造形成(OS7 ナノ・マイクロ加工)

概要

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This study aims to fabricate three dimensional microstructures on single crystal silicon by tribo-nanolithography (TNL) and wet chemical etching. The processed area of single crystal silicon by diamond tip withstands etching in KOH solution, and consequently protruding microstructure can be fabricated. TEM and SIMS analyses are utilized to study the mechanism of masking effect. As a result, it can be known that crystal silicon structures are converted to amorphous silicon by TNL process, resulting in affectting to the etch mask against KOH solution. Furthermore, comparison of etch rate between amorphous and single crystal silicon is conducted.
社団法人日本機械学会の論文
2004-11-19