Structure Study of Si Nanocrystals Formed by Electron-Induced Reduction of SiO_2 at High Temperature
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概要
- 論文の詳細を見る
Si nanocrystals were formed in a SiO_2 thin film by irradiation of a high-intensity electron beam at about 900 K inside an ultrahigh vacuum field emission transmission electron microscope (UHV-FE-TEM). The structure of the nanocrystals was investigated by high-resolution transmission electron microscopy (HRTEM) and electron diffraction analysis. Relations among the lattice distances suggest that the structure is not a diamond structure. For the structural model, a beta-tin structure with elongation along the c-axis and shrinkage along the a-axes compared to the diamond structure is proposed.
- 社団法人応用物理学会の論文
- 1999-12-30
著者
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FURUYA Kazuo
National Research Institute for Metals
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Yoshihara Kazuhiro
National Research Institute For Metals
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Yoshihara Kazuhiro
National Institute Of Animal Health
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Furuya Kazuo
National Institute For Materials Science
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TAKEGUCHI Masaki
National Institute for Materials Science
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Takeguchi Masaki
National Research Institute For Metals
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Takeguchi Masaki
National Institute for Material Science, 3-13 Sakura, Tsukuba 305-0003, Japan
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