In Situ Microlithography of Si and GaAs by a Focused Ion Beam in a 200keV TEM
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概要
- 論文の詳細を見る
- Published for the Japanese Society of Electron Microscopy by Oxford University Pressの論文
- 1996-08-01
著者
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SAITO Tetsuya
National Research Institute for Metals
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Saito Tetsuya
Department Of Biological And Chemical Engineering Faculty Of Engineering Gunma University:the Mushro
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Furuya Kazuo
National Institute For Materials Science
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Yamada Isamu
Jeol Datum Ltd.
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Saito Tetsuya
National Institute For Materials Science
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HATA Takao
JEOL Ltd.
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