Resolution in New Nanofabrication Technique Combining Electron-Beam-Induced Deposition and Low-Energy Ion Milling
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概要
- 論文の詳細を見る
A new nanofabrication technique in which the deposits fabricated by electron-beam-induced deposition (EBID) are used as masks for low-energy ion milling was performed with various masks deposited at different deposition times, and the shape changes of the W mask and GaAs substrates caused by ion milling were observed. From these results, the time evolution of the shape change of the fabricated structures was studied, and the resolution dependence of the structure to the mask size was determined. The W mask showed a lower etch rate, proving its effectiveness as a mask for ion milling. Nanostructures less than 10 nm in diameter can be fabricated by this method.
- 2005-07-15
著者
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Furuya Kazuo
National Institute For Materials Science
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MITSUISHI Kazutaka
National Institute for Materials Science
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Tanaka Miyoko
National Institute For Materials Science
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TAKEGUCHI Masaki
National Institute for Materials Science
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SHIMOJO Masayuki
On leave from Precision and Intelligence Laboratory, Tokyo Institute of Technology
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Shimojo Masayuki
On leave from Precision and Intelligence Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
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Takeguchi Masaki
National Institute for Material Science, 3-13 Sakura, Tsukuba 305-0003, Japan
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