Relationship between Remaining Solvent and Acid Diffusion in Chemically Amplified Deep Ultraviolet Resists
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1996-12-30
著者
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YOSHINO Hiroshi
Tohoku University
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YOSHINO Hiroshi
Graduate School of Engineering, Tohoku University
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Hashimoto S
Texas Instruments Tsukuba R & D Center Ltd. Ibaraki Jpn
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Itani T
Selete Tsukuba Jpn
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ITANI Toshiro
NEC Corporation
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YOSHINO Hiroshi
NEC Corporation
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HASHIMOTO Shuichi
NEC Corporation
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YAMANA Mitsuharu
NEC Corporation
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SAMOTO Norihiko
NEC Corporation
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KASAMA Kunihiko
NEC Corporation
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Yoshino H
Graduate School Of Engineering Tohoku University
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Itani T
Semiconductor Leading Edge Technol. Inc. Yokohama Jpn
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Kasama K
Ulsi Device Development Laboratory Nec Corporation
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Yamana M
Nec Electronics Corp. Kanagawa Jpn
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Samoto N
Nec Corp. Kanagawa Jpn
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