Grain Growth and Conductive Characteristics of Super Thin Polysilicon Films by Oxidation
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1985-06-20
著者
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OHSHIMA Takeshi
Japan Atomic Energy Research Institute
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Hayashi Hisao
Sony Corp. Research And Development Dept. Semiconductor Group
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Hayashi Hisao
Department Of Medicine Faculty Or Pharmaceutical Sciences Hokuriku University
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Noguchi T
Sony Corp. Yokohama Jpn
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NOGUCHI Takashi
Sony SC ULSI R&D Laboratories
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Ohshima T
Oki Electric Ind. Co. Ltd. Tokyo Jpn
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OHSHIMA Takefumi
SONY Corp. Semiconductor Group
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Noguchi Takashi
Sony Corporation Research Center:(present Address) Sony Corp. Solid State Systems Consumer Camera Di
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