Fluorine-Doped Tin Dioxide Thin Films Prepared by Thermal Decomposition of Metallic Complex Salts
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概要
- 論文の詳細を見る
Fluorine-doped tin dioxide thin films were prepared by thermal decomposition of metallic complex salts. Films of high transparency and low electric resistivity (2.68 × 10^<-3> Ω・cm) were o btained by dip coating glass substrates with a raw-material solution followed by heating at 500℃ for 60 min in a nitrogen atmosphere.
- 社団法人応用物理学会の論文
- 1989-02-20
著者
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Kitamura Kenji
Department Of Pediatrics Mie National Hospital
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Maruyama Toshiro
Department Of Chemical Engineering Faculty Of Engineering Kyoto University
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Kitamura Kenji
Department Of Chemical Engineering Faculty Of Engineering Kyoto University
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