Chemical-Kinetics Model for the Growth of a Multicellular Tumor Spheroid
スポンサーリンク
概要
- 論文の詳細を見る
We propose a model based on chemical kinetic analysis for the growth of a multicellular tumor spheroid. The growth of avascular tumor cells is simulated by an autocatalytic reaction where the cell itself converts glucose and oxygen into a new cell. Glucose is assumed to be the limiting substrate, and its depletion gives rise to the necrosis of tumor cells. Since the depletion is assumed to be the major cause of the central necrosis, the death of tumor cells is determined by the critical value of the concentration. The concentration profile of glucose inside the tumor is obtained from a reaction-diffusion equation. The characteristic features of the experimental results are demonstrated well in this model.
- 2009-03-01
著者
-
Maruyama Toshiro
Department Of Chemical Engineering Kyoto University
-
Maruyama Toshiro
Department Of Chemical Engineering Faculty Of Engineering Kyoto University
-
KATSUDA Takeshi
Institute of Industrial Science (IIS), University of Tokyo
-
Katsuda Takeshi
Institute Of Industrial Science (iis) The University Of Tokyo
-
Katsuda Takeshi
Institute Of Industrial Science (iis) University Of Tokyo
関連論文
- Chemical-Kinetics Model for the Growth of a Multicellular Tumor Spheroid
- Silicorn Dioxide Thin Films Prepared from Silicon Tetraacetate Using ArF Excimer Laser by Chemical Vapor Deposition
- Electrical Characterization of Silicon Dioxide Thin Film Prepared by ArF Excimer Laser Chemical Vapor Deposition frorn Silicon Tetraacetate
- Silicon Dioxide Thin Films Prepared Thermal Decomposition of Silicon Tetraacetate : Surfaces, Interfaces and Films
- NO_x Removal Using Ammonia Radicals Prepared by Intermittent Dielectric Barrier Discharge at Atmospheric Pressure
- Indium-Tin Oxide Thin Films Prepared by Chemical Vapor Deposition from Metal Acetates
- Electrical Characterization of Silicon Dioxide Thin Films Prepared by Chemical Vapor Deposition from Tetrakis(diethylamino)silane and Ozone
- Fluorine-Doped Indium Oxide Thin Films Prepared by Chemical Vapor Deposition
- Surface Modification of Poly (tetrafluoroethylene) Film Using Dielectric Barrier Discharge of Intermittent Pulse Voltage
- Transplantation of a fetal liver cell-loaded hyaluronic acid sponge onto the mesentery recovers a Wilson's disease model rat
- High-T_c Superconducting Bi-Pb-Sr-Ca-Cu-O Thin Films Prepared by Thermal Decomposition of Metallic Complex Salts
- Photo-Assisted Metalorganic Chemical Vapor Deposition of Zinc Oxide Thin Films
- Fluorine-Doped Tin Dioxide Thin Films Prepared by Thermal Decomposition of Metallic Complex Salts
- Superconducting Bi-Sr-Ca-Cu-O Thin Films Prepared by Thermal Decomposition of Metallic Complex Salts : Electrical Properties of Condensed Matter
- Plasma Metalorganic Chemical Vapor Deposition of Indium Oxide Thin Films
- Silicon Dioxide Thin Films Prepared by Chemical Vapor Deposition from Silicon Tetraacetate
- Superconducting YBa_2Cu_3O_ Thin Films Prepared by Thermal Decomposition of Metallic Complex Salts : Electrical Properties of Condensed Matter
- ELECTRON MICROSCOPIC STUDIES ON THE ADRENAL MEDULLA AND ADRENAL CORTEX OF HYPERTENSIVE RATS : 2. EXPERIMENTAL HYPERTENSIVE RATS
- Magnesium Oxide Thin Films Prepared by Chemical Vapor Deposition from Magnesium 2-Ethylhexanoate
- Electron Microscopic Studies on the Adrenal Medulla and Adrenal Cortex of Hypertensive Rats : 1. Spontaneously Hypertensive Rats
- Cobalt Thin Films Prepared by Cherrnical Vapor Deposition from Cobalt Acetylacetonates
- Optimum Conditions for NO Reduction Using Intermittent Dielectric Barrier Discharge at Atmospheric Pressure
- CHROMOSOME STUDIES OF BONE MARROW CELLS FROM NORMAL AND ALLOXAN DIABETIC WISTAR RATS
- Copper Oxide Thin Films Prepared from Copper Dipivaloylmethanate and Oxygen by Chemical Vapor Deposition
- Alumina-anchored cobalt porphine catalysts for the conversion of quadricyclane to norbornadiene.
- Laboratory liquid-solid reactor in heterogeneous catalysis.
- Flow of settling slurries in horizontal pipes.
- Transition to turbulence in starting pipe flows.
- The flow structure of slurries in horizontal pipes.
- STRUCTURE OF THE TURBULENCE IN PULSATING PIPE FLOWS
- NOx Removal Using Ammonia Radicals Prepared by Intermittent Dielectric Barrier Discharge at Atmospheric Pressure