Magnesium Oxide Thin Films Prepared by Chemical Vapor Deposition from Magnesium 2-Ethylhexanoate
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概要
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Magnesium oxide thin films were prepared by a low-temperature atmospheric-pressure chemical vapor deposition method. The raw material was magnesium 2-ethylhexanoate, which is nontoxic and easy to handle. The deposition can be carried out in air. At a reaction temperature above 450℃, a highly [100]-oriented polycrystalline film can be obtained on amorphous substrates.
- 社団法人応用物理学会の論文
- 1990-05-20
著者
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Maruyama Toshiro
Department Of Chemical Engineering Faculty Of Engineering Kyoto University
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Shionoya J
Department Of Chemical Engineering Faculty Of Engineering Kyoto University
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Shionoya Jun
Department Of Chemical Engineering Faculty Of Engineering Kyoto University
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