Low-Temperature Growth of Thin Films of Al_2O_3 by Sequential Surface Chemical Reaction of trimelhylaluminum and H_2O_2
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1991-06-15
著者
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Fan J‐f
Riken The Institute Of Physical And Chemical Research
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Toyoda Koichi
The Institute of Physical and Chemical Research Wako
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Fan Jia-fa
Institute Of Materials Science University Of Tsukuba:(present Address)insitute Of Physical And Chemi
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Fan Jia-Fa
The Institute of Physical and Chemical Research (RIKEN)
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Sugioka Koji
The Institute of Physical and Chemical Research (RIKEN)
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Toyoda Koichi
The Institute Of Physical And Chemical Research
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Sugioka Koji
Laser Technology Lab., RIKEN- Institute of Physical and Chemical Research
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