Loss Increase of (LuNdBi)_3(FeAl)_50_12 Films Caused by Sputter Etching
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概要
- 論文の詳細を見る
Rib waveguides, which are made of magnetic garnet films of composition (LuNdBi)3(FeAl)_50_12 (LNB), fabricated by Ar sputter etching have large propagation loss in comparison with LNB slab waveguides. X-ray photoelectron spectroscopy (XPS) is used to investigate chemical states of constituent elements existing in the surface layer where a Ti mask has been deposited during the etching process. The analysis shows that Fe chemical shift due to Ar^+ ion bombardment can cause increase in the optical absorption loss, and hence the propagation loss. It is effective for suppressing the loss increase to employ a Si0_2 mask deposited onto LNB film instead of a Ti mask.
- 社団法人応用物理学会の論文
- 1994-11-15
著者
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MIZUMOTO Tetsuya
Department of Electrical and Electronic Engineering, Tokyo Institute of Technology
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Naito Yoshihiko
Institute Of Space And Astronautical Science
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Yokoi Hideki
Department of Biochemistry, College of Agriculture, Kyoto Prefectural University
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Yokoyama H
Tokyo Inst. Technol. Yokohama Jpn
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Yokoi H
Tokyo Inst. Technol. Tokyo Jpn
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Yokoi Hideki
Department Of Electrical And Electronic Engineering Graduate School Of Science And Engineering Tokyo
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Yokoi H
Graduate School Of Science And Engineering Tokyo Institute Of Technology
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NAITO Yoshiyuki
Department of Anesthesia, Kobe City General Hospital
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Naito Y
Kobe City General Hospital Kobe Jpn
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Naito Yoshiyuki
Department Of Anesthesia Kobe City General Hospital
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IDA Takehiro
Department of Physical Electronics, Tokyo Institute of Technology
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KOZAKAI Kazuki
Department of Physical Electronics, Tokyo Institute of Technology
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Ida Takehiro
Department Of Physical Electronics Tokyo Institute Of Technology
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Kozakai Kazuki
Department Of Physical Electronics Tokyo Institute Of Technology
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Mizumoto T
Tokyo Inst. Technol. Tokyo Jpn
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Mizumoto Tetsuya
Department Of Eee Tokyo Institute Of Technology
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Yokoi H
Department Of Electrical And Electronic Engineering Graduete School Of Science And Engineering Tokyo
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