Sputter-Deposited Si Layer for Optical Isolator with Si Guiding Layer
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概要
- 論文の詳細を見る
An optical isolator with a Si guiding layer that makes use of a nonreciprocal phase shift is discussed. The Si guiding layer was sputter-deposited on a garnet substrate. The magnetooptic waveguide in the optical isolator had an air/Si/magnetic garnet structure. The Si layer deposited on the garnet substrate was analyzed by spectroscopic ellipsometry and X-ray diffraction. A rib waveguide was fabricated on the deposited Si layer and evaluated. The nonreciprocal phase shift in the magnetooptic waveguide was calculated at a wavelength of 1.55 μm. The required thickness of the magnetic-garnet cladding layer was obtained by calculating the nonreciprocal phase shift.
- 2009-06-25
著者
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Sasaki Keigo
Department Of Chemistry Graduate School Of Science Kyoto University
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Yokoi Hideki
Department of Biochemistry, College of Agriculture, Kyoto Prefectural University
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Yokoi Hideki
Department of Electronic Engineering, Shibaura Institute of Technology, 3-7-5 Toyosu, Koto-ku, Tokyo 135-8548, Japan
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Aiba Takayoshi
Department of Electronic Engineering, Shibaura Institute of Technology, 3-7-5 Toyosu, Koto-ku, Tokyo 135-8548, Japan
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