Surface Damage in InP Induced during SiO_2 Deposition by rf Sputtering
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1979-06-05
著者
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Oe Kunishige
Musashino Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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椿 光太郎
東洋大学工学部
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Ando Seigo
Musashino Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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Tsubaki Kotaro
Musashino Electrical Communication Laboratory
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Sugiyama Koichi
Musashino Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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Oe Kunishige
Musashino Electrical Communication Laboratory
-
Sugiyama Koichi
Musashino Electrical Communication Laboratory
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SUGIYAMA Koichi
Musashino Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation
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