反応性プラズマの計測とラジカル制御の新展開

概要

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The latest development in diagnostics of reactive plasmas is reviewed from the standpoint of radical control for materials processing. Conventional techniques such as a Langmuir probe method, mass spectrometry and optical emission spectrometry often give misleading results, especially for important measurements of radicals, negative ions and particulates in processing plasmas. Here are presented several innovative diagnostic methods which have been developed in late years. First, a plasma oscillation method is available for the precise measurement of electron density in CVD plasmas and negative ion plasmas. Second, IR laser absorption spectroscopy enables us to measure radicals having no visible emission line. In addition, such radicals are detectable with a highly sensitive multi-element optical-absorption method. Finally, appearance mass spectrometry has been established as a powerful inexpensive tool for monitoring various radical species in a plasma and for measuring collision cross sections.
社団法人プラズマ・核融合学会の論文
1995-03-25