Si(111)表面上の孤立したナノ構造の形成と崩壊 : 招待講演

概要

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Formation process and thermal relaxation of three dimensional islands like pyramids have been investigated by a temperature variable scanning tunneling microscopy(STM). Isolated single islands on Si(111) surfaces between 700K and 750K have been produced using an STM. It is found that island is produced with small distance between the tip and the sample substrate, and sample polarity does not affect island formation. Two types of pyramids are produced. Islands with production probability of 75% are normal stacking at the interface between the island and the substrate, and called type N. For islands with production probability of 25%, there is a stacking fault at the interface, and called type F. Decay rate of the type F island is larger than that of type N. During decomposition of type N, the facets of the pyramid are split into two parts. For the type F islands, the pyramids decay nearly layer-by-layer without splitting and step bunching.
日本結晶成長学会の論文
2000-07-01