アークイオンプレーティング法によるアルミニウム基板へのTiN膜の形成とその機械的特性

概要

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TiN film, 3 μm in thickness, was deposited on aluminum (JIS A 1050) and aluminum alloy (JIS A 2017 and JIS A 5052) substrates by an Arc Ion Plating (AIP) method. Bias voltage and N_2 gas pressure were changed to examine their role on hardness and residual stress of TiN film. Wear experiment was also conducted using a ball-on-disk type wear apparatus. Vickers hardness tests revealed high value (HV=2 100〜2 400) which depends on both bias voltage and N_2 gas pressure. The TiN films exhibited very high {111} preferred orientation. Residual stresses in the TiN film were measured by the two-exposure X-ray stress measuring method as a function of N_2 gas pressure. Very high compressive residual stresses, -6.3〜-4.6GPa, were observed. The depth of wear scars on the surface of the processed specimens were greatly shallow.
一般社団法人日本機械学会の論文
1999-07-25