Investigation of Chemical Vapor Deposition (CVD)-Derived Cobalt Silicidation for the Improvement of Contact Resistance
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-06-15
著者
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Moon Joo-tae
Process Development Team Semiconductor R&d Division Samsung Electronics Co. Ltd.
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CHUNG U-In
Process Development Thani, Semiconductor R&D Division, Sam suns Uectronics Co., Ltd.
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KIM Sung-Tae
Process Development Team, Semiconductor R&D Division, Samsung Electronics Co., Ltd.
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KIM Hyun-Su
Process Development Team, Semiconductor R&D Center, Samsung Electronics Co., Ltd.
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YUN Jong-Ho
Process Development Team, Semiconductor R&D Center, Samsung Electronics Co., Ltd.
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MOON Kwang-Jin
Process Development Team, Semiconductor R&D Center, Samsung Electronics Co., Ltd.
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SOHN Woong-Hee
Process Development Team, Semiconductor R&D Center, Samsung Electronics Co., Ltd.
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JUNG Sug-Woo
Process Development Team, Semiconductor R&D Center, Samsung Electronics Co., Ltd.
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JUNG Eun-Ji
Process Development Team, Semiconductor R&D Center, Samsung Electronics Co., Ltd.
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KIM Se-Hoon
CVD Division, COMTECS Co., Ltd.
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BAE Nam-Jin
CVD Division, COMTECS Co., Ltd.
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CHOI Gil-Heyun
Process Development Team, Semiconductor R&D Center, Samsung Electronics Co., Ltd.
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RYU Byung-Il
Process Development Team, Semiconductor R&D Center, Samsung Electronics Co., Ltd.
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Kim Sung-tae
Advanced Process Development Team Semiconductor R&d Division Samsung Electronics Co. Ltd.
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Ryu Byung-il
Process Development Team Semiconductor R&d Center Samsung Electronics Co. Ltd.
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Moon Kwang-jin
Process Development Team Semiconductor R&d Center Samsung Electronics Co. Ltd.
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Kim Hyun-su
Process Development Team Semiconductor R&d Center Samsung Electronics Co. Ltd.
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Yun Jong-ho
Process Development Team Semiconductor R&d Center Samsung Electronics Co. Ltd.
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Kim Se-hoon
Cvd Division Comtecs Co. Ltd.
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Bae Nam-jin
Cvd Division Comtecs Co. Ltd.
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