A New Stacked-Mask Process Utilizing Spun-on Carbon Film for Sub-130-nm Etching
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-10-15
著者
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Shiobara E
Toshiba Corp. Semiconductor Co. Kanagawa Jpn
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Shiobara Eishi
Process & Manufacturing Engineering Center Toshiba Corporation Semiconductor Company
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Sato Yasuhiko
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corporation
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Shibata Tsuyoshi
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corporation
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ONISHI Yasunobu
Process and Manufacturing Engineering Center, Toshiba Corporation
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ABE Junko
Process & Manufacturing Engineering Center, Toshiba Corporation Semiconductor Company
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HAYASHI Hisataka
Process & Manufacturing Engineering Center, Toshiba Corporation Semiconductor Company
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KISHIGAMI Daizo
Process & Manufacturing Engineering Center, Toshiba Corporation Semiconductor Company
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OHIWA Tokuhisa
Process & Manufacturing Engineering Center, Toshiba Corporation Semiconductor Company
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