Characterization of Microbridges Generated on Negative Resist Patterns
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1999-03-15
著者
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Shiobara E
Toshiba Corp. Semiconductor Co. Kanagawa Jpn
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Shiobara Eishi
Process & Manufacturing Engineering Center Toshiba Corporation Semiconductor Company
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Sato Y
Japan Advanced Inst. Sci. And Technol. Ishikawa Jpn
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NAKAZAWA Keisuke
ULSI Process Engineering Laboratory, Microelectronics Engineering Laboratory
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SHIOBARA Eishi
ULSI Process Engineering Laboratory, Microelectronics Engineering Laboratory
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ASANO Masafumi
ULSI Process Engineering Laboratory, Microelectronics Engineering Laboratory
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SANO Yasuhiko
ULSI Process Engineering Laboratory, Microelectronics Engineering Laboratory
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TANAKA Satoshi
ULSI Process Engineering Laboratory, Microelectronics Engineering Laboratory
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OONISHI Yasunobu
ULSI Process Engineering Laboratory, Microelectronics Engineering Laboratory
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Sano Yasuhiko
Ulsi Process Engineering Laboratory Microelectronics Engineering Laboratory
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Asano Masafumi
Ulsi Process Engineering Laboratory Microelectronics Engineering Laboratory
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Oonishi Yasunobu
Ulsi Process Engineering Laboratory Microelectronics Engineering Laboratory
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Nakazawa Keisuke
Ulsi Process Engineering Laboratory Microelectronics Engineering Laboratory:(present Address)semicon
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Tanaka Satoshi
Ulsi Process Engineering Laboratory Microelectronics Engineering Laboratory
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