Yoo Woo | Wafer Masters Inc.

スポンサーリンク

概要

関連著者

もっと見る

著作論文

Homoepitaxial Chemical Vapor Deposition of 6H-SiC at Low Temperatures on {011^^-4} Substrates
Photoluminescence of Ti Doped 6H-SiC Grown by Vapor Phase Epitaxy
急速熱処理した極浅イオン注入シリコンウエハの紫外ラマン分光による非破壊結晶性評価(シリコン関連材料の作製と評価)
Three Dimensional Stress Mapping of Silicon Surrounded by Copper Filled through Silicon Vias Using Polychromator-Based Multi-Wavelength Micro Raman Spectroscopy
Thermal Behavior of Large-Diameter Silicon Wafers during High-Temperature Rapid Thermal Processing in Single Wafer Furnace
Design of Single-Wafer Furnace and Its Rapid Thermal Processing Applications
Single Wafer Furnace and Its Thermal Processing Applications
Slip-Free Rapid Thermal Processing in Single Wafer Furnace
Titanium Silicide Formation and Anneal Using a Susceptor-Based Low Pressure Rapid Thermal Processing System
Highly Reliable, Backside Emissivity Independent Cobalt Silicide Process Using a Susceptor-Based Low Pressure Rapid Thermal Processing System
Pulsed Focused-Laser Beam Annealing of Ultra-Shallow Implanted Silicon and In Situ Dopant Activation Monitoring
Noncontact In-Line Monitoring of Ge Content and Thickness Variations of Epitaxial Si_Ge_x Layers on Si(100) Using Polychromator-Based Multiwavelength Micro-Raman Spectroscopy
Design of Multi-Wavelength Micro Raman Spectroscopy System and Its Semiconductor Stress Depth Profiling Applications
Impact of Annealing Methods and Sequences on Dopant Activation and Diffusion of Ultra-shallow Implanted Silicon
Solid-State Phase Transformation in Cubic Silicon Carbide
ホトルミネセンス法およびDLTS法によるシリコン極浅接合の再結晶化過程の評価(シリコン関連材料の作製と評価)
Redistribution of Boron and Fluorine Atoms in BF2 Implanted Silicon Wafers during Rapid Thermal Annealing

もっと見る

スポンサーリンク