Transition behaviour between erosion and deposition on a tungsten surface exposed to deuterium plasmas containing carbon impurities

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The erosion and deposition processes of tungsten (W) exposed to deuterium (D) plasmas containing a small amount (${<}10$%) of carbon (C) ions are investigated by using a dynamic Monte Carlo simulation. The emphasis is placed on an abrupt transition from C deposition to W erosion as the plasma temperature is increased from 10 eV to 100 eV. The transition occurs as a result of little reflection (much deposition) of incident C ions from a C-rich layer and enhanced sputtering of deposited C atoms from a W–C mixed layer. When the deposited C thickness is increased just below the transition temperature, the C emission yield (i.e., the sum of the C reflection coefficient and the C sputtering yield) decreases so that a thick C-rich layer (2–8 μm or more), growing in proportion to the plasma fluence, is formed on W. When the deposited C thickness is decreased above the transition temperature, the C emission yield increases so that there is only a thin W–C mixed layer (100–300 nm), where the depth profile of deposited C is independent of the temperature, fluence and C-concentration of the plasma. The transition is strongly related to the depth profile of the deposited C in the W bulk, therefore, the transition temperature fluctuates according to the erosion and deposition histories and is strongly influenced by the chemical sputtering yield of the deposited C.
Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
2004-09-15

Transition behaviour between erosion and deposition on a tungsten surface exposed to deuterium plasmas containing carbon impurities

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