Production of Atomic-Oxygen Negative-Ion Beam by Positive Ion-Induced Sputtering of Semiconductive BaTiO_3 Ceramic
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概要
- 論文の詳細を見る
When a semiconductive BaTiO_3 ceramic surface is bombarded by a keV positive-ion beam, atomic-oxygen negative ions are emitted from the surface in number several tens of times greater than the numbers of other negative ions and neutrals. The dependence of the number of oxygen negative ions on the angle of incidence, the energy and the mass of the bombarding positive ions was investigated, and the ion yield was estimated to be several times greater than 0.1 for the typical conditions. The significance of this finding on techniques for producting negative ions is discussed.
- 社団法人応用物理学会の論文
- 1984-12-20
著者
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Ohya Kaoru
Faculty Of Engineering Tokushima University
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Mori Ichiro
Technical College The University Of Tokushima
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Ohya Kaoru
Faculty Of Engineering The Universiry Of Tokushima
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Ishida Keiji
Faculty of Engineering, Tokushima University
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Ishida Keiji
Faculty Of Engineering Tokushima University
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