Reaction of Hydrogen-Desorbed Si(100) Surfaces with Water during Heating and Cooling
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概要
- 論文の詳細を見る
The reaction of hydrogen-terminated Si(100) surfaces with water during heating is analyzed using a combination of heating and cooling in thermal desorption spectroscopy. The reaction of the Si surface with water after hydrogen desorption is observed even at about 400°C at a low concentration of water molecules. An estimation method of surface hydrogen coverage by the combined measurement is proposed and the surface coverage as a function of temperature is estimated for quantitative understanding of hydrogen desorption and the subsequent reaction during heating. The combined measurement in thermal desorption spectroscopy is useful for revealing the reaction after hydrogen desorption during heating and for estimating the surface coverage.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2004-12-15
著者
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Morita Mizuho
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
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Urabe Shinichi
Department Of Precision Science And Technology Graduate School Of Engineering Osaka University
-
Morita Satoru
Department Of Cardiovascular Surgery National Hospital Organization Higashihiroshima Medical Center
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Nishimura Kazuo
Department Of Agricultural Chemistry Faculty Of Agriculture Kyoto University
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Morita Satoru
Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
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Nishimura Kazuo
Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
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