Absolute Line Profile Measurements of Silicon Plane Mirrors by Near-Infrared Interferometry
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概要
- 論文の詳細を見る
Absolute line profiles of three silicon plane mirrors were measured by the three-flat method using a near-infrared interferometer. The interferometer was constructed using a near-infrared laser diode with 1310 nm wavelength light, to which the silicon plane mirror is transparent. The maximum height difference in the absolute line profiles is less than 8.9 nm and the rms value of height difference is less than 2.0 nm for a measured line of 12.7 mm. The near-infrared interferometer is useful for measuring a set of line profiles at the height difference level to calculate the absolute flatness of silicon plane mirrors.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2008-12-25
著者
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Arima Kenta
Department Of Precision Science And Technology Graduate School Of Engineering Osaka University
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Morita Mizuho
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
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Uchikoshi Junichi
Department Of Precision Science And Technology Graduate School Of Engineering Osaka University
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Ajari Noritaka
Department Of Precision Science And Technology Graduate School Of Engineering Osaka University
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Morita Mizuho
Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, Suita, Osaka 565-0871, Japan
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Tsuda Amane
Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, Suita, Osaka 565-0871, Japan
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Okamoto Taichirou
Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, Suita, Osaka 565-0871, Japan
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Uchikoshi Junichi
Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, Suita, Osaka 565-0871, Japan
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Ajari Noritaka
Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, Suita, Osaka 565-0871, Japan
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