Fabrication of Nanodot Arrays on Si by Pulsed Laser Deposition Using Anodic Aluminum Oxide Nanopore Membrane as Mask
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概要
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We demonstrate the fabrication of metal and semiconductor nanodot arrays on Si by pulsed laser deposition using an anodic alumina membrane as a mask. A Hexagonal-close-packed nanopore membrane mask was fabricated by the anodic oxidation of aluminum sheet. Pulsed laser deposition of Ag, Ni, ZnO, and Er-doped Si (Si:Er) nanodots was performed on a Si substrate to which an alumina membrane mask adheres by van der Waals interaction. Highly ordered arrays of Ag, Ni, ZnO, and Si:Er nanodots with average diameters ranging from 55 to 86 nm and a periodicity of ${\sim}100$ nm were obtained. Also, the time-resolved images of laser-produced plasma plumes were analyzed to examine the dynamical properties of the ejected materials.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2004-11-15
著者
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Bae Chang
Department Of Chemistry Kyung Hee University
-
Ha Jeong
Department Of Chemical And Biological Engineering Korea University
-
Nam Sang
Department Of Biochemistry College Of Pharmacy Kyung-hee University
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Seo Hyejin
Department Of Chemical And Biological Engineering Korea University
-
Nam Woosung
Department Of Chemical And Biological Engineering Korea University
-
Park Sung
Department Of Anesthesia And Pain Medicine School Of Medicine Pusan National University
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Park Seung
Department Of Anatomy College Of Medicine Konkuk University
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Seo Hyejin
Department of Chemical and Biological Engineering, Korea University, Seoul 136-701, Korea
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Nam Woosung
Department of Chemical and Biological Engineering, Korea University, Seoul 136-701, Korea
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