Nanofabrication Using Atomic Force Microscopy Lithography Combined with Optical Lithography
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概要
- 論文の詳細を見る
A scanning probe lithography (SPL) system based on atomic force microscopy (AFM) enables the drawing of patters having high resolution. We fabricated fine electrodes on a carbon nanotube (CNT) having large contact pads by using a hybrid process of AFM lithography and optical lithography. This hybrid process is well-suited for simultaneously drawing patterns consisting of structures several tens of nanometers and millimeters in scale.
- 2001-06-30
著者
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Ishibashi Masayoshi
Advanced Research Laboratory Hitachi Ltd.
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Kato Midori
Advanced Research Laboratory Hitachi Ltd.
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Hashizume Tomihiro
Advanced Research Lab., Hitachi, Ltd., Hatoyama, Saitama 350-0395, Japan
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Kato Midori
Advanced Research Laboratory, Hitachi, Ltd., Hatoyama, Saitama 350-0395, Japan
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Heike Seiji
Advanced Research Lab., Hitachi, Ltd., Hatoyama, Saitama 350-0395, Japan
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