Nanofabrication Using Atomic Force Microscopy Lithography Combined with Optical Lithography

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Fabrication of Four-Probe Fine Electrodes Using Scanning-Probe Nanofabrication
Fabrication Process of Fine Electrodes Using Shadow Mask Evaporation and Tip-Induced Local Oxidation
Stability of Metallofullerene LaC_ on UV Light Irradiation
Preparation and Oxidation of Metallofullerenes Containing Praseodymium
Nanofabrication Using Atomic Force Microscopy Lithography for Molecular Devices
Dot-Array Resist Patterning Using Scanning Probe Microscopy with a Hybrid Current-Voltage Control Method
Nanofabrication Using Atomic Force Microscopy Lithography Combined with Optical Lithography
Combining Atomic Force Microscopic Lithography with Photolithography
Fabrication of High-Resolution and High-Aspect-Ratio Patterns on a Stepped Substrate by Using Scanning Probe Lithography with a Multilayer-Resist System
Fabrication of High-Resolution and High-Aspect-Ratio Patterning on a Stepped Substrate by Scanning Probe Lithography Using a Multilayer-Resist System
Characteristics of Nanoscale Lithography Using AFM with a Current-Controlled Exposure System
Characteristics of Nanoscale Lithography Using Atomic Force Microscope with Current-Controlled Exposure System
Direct Imaging of Thermodynamic Process In Atom Migration by Using Scanning Tunneling Microscopy
Reduced Density of Missing-Dimer Vacancies on Tungsten-Contaminated Si (100)-(2×n) Surface by Hydrogen Termination
Control of Surface Current on a Si(111) Surface by Using Nanofabrication
Theoretical Study of Ga Adsorbates around Dangling-Bond Wires on am H-Terminated Si Surface: Possibility of Atomic-Scale Ferromagnets
Initial Stage of Molecular Adsorption on Si(100) and H-terminated Si(100) Investigated by UHV-STM(STM-Si(001))
Scanning Tunneling Spectroscopy of Dangling-Bond Wires Fabricated on the Si(100) -2 × 1 -H Surface
Property Change of Si(111) Surface by Scanning Tunneling Microscope Manipulation
Evaluation of Thin Silicon Dioxide Layers by Beam Assisted Scanning Tunneling Microscope
Analysis of Rubbed Polyimide Films by Polarized Infrared Spectroscopy : Effects of Immersion in Organic Solvents
Pulse Injection of Carbon Nanotubes onto a H-terminated Si(100) Surface
First Principles Study of Dihydride Chains on H-Terminated Si(100)-2×1 Surface (Special Issue: Scanning Tunneling Microscopy/Spectroscopy and Related Techniques)
Scanning Tunneling Microscopy/Spectroscopy of La_2@C_ Multilayer Islands on Si(100)-2×1-H Surfaces
Initial-Stage Dihydride Formation on Si(100)-2x1-H Surface
Scanning Tunneling Microscopy of the GaAs(001) Surface Reconstructions(STM-GaAs)
FI-STM Investigation of Fullerenes Adsorbed on the Semiconductor and Metal Surfaces(STM-C_)
Initial Backbond Oxidation at an Unpaired Dangling Bond Site on a Hydrogen-Terminated Si (100) 2×1 Surface
Electrical Conductivity Measurement of DNA Double-Stranded Chains by "One-by-One" Cutting Method Using Atomic Force Microscopy(Cross-disciplinary physics and related areas of science and technology)
Electrical Conduction of Ag Nanowire Fabricated on Hydrogen-Terminated Si(100) Surface (Special Issue: Scanning Tunneling Microscopy/Spectroscopy and Related Techniques)
Study of Initial Stage of Molecular Adsorption on Si(100) by Scanning Tunneling Microscopy
Growth Control of Nano-Needle on Silicon Surface Using Scanning Tunneling Microscope
Development of an In-Situ Method of Fabricating Artificial Atom Structures on the Si(100) Surface
Interaction of Ga Adsorbates with Dangling Bonds on the Hydrogen Terminated Si(100) Surface
In Situ Direct Imaging of Scanning Tunneling Microscope Tip Apex
In Situ Direct Imaging of Scanning Tunneling Microscope Tip Apex
Room-Temperature Adsorption of Si Atoms on H-terminated Si(001)-2×1 Surface(Condensed Matter: Structure, Mechanical and Thermal Properties)
Observation of Color Image Using Near-Field Optical Microscope
Nanofabrication Using Atomic Force Microscopy Lithography Combined with Optical Lithography
Fabrication of Four-Probe Fine Electrodes Using Scanning-Probe Nanofabrication
Characteristics of Nanoscale Lithography Using AFM with a Current-Controlled Exposure System

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