ステアリン酸単結晶ヘキ開面上のBi蒸着膜

概要

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The micromorphology and the formation of bismuth films deposited onto stearic acid substrate were observed by transmission electron microscope. Vacuum-deposition of bismuth onto stearic acid substrate, which was cleaved in air, was carried out at the deposition rates around 1Å/5 at a residual gas pressure of about 10-6 Torr. The temperature of substrate during deposition was kept at 15 °C. The triangular, the square, the trapezoidal and the hexagonal shapes of islands are typical in the various kinds of island structures of bismuth films. Thin bismuth films grew epitaxially on the cleaved surface of stearic acid at a temperature higher than 20 °C and there were two different preferable orientations of bismuth films for the crystallographic direction of the substrate. It is peculiar that stearic acid single crystal is quite within the bounds of possibility of the use as the substrate for epitaxy and that the epitaxial temperature of bismuth on stearic acid crystal is much lower than that on mica by more than 100°C.
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