2721 ECRイオンスパッタ法を用いたTiNi形状記憶合金薄膜創製技術の開発(S33-3 材料の超精密加工とマイクロ/ナノ加工の動向(3),S33 材料の超精密加工とマイクロ/ナノ加工の動向)

概要

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In order to produce a high quality SMA thin film for MEMS, we focus on the search of the best conditions to control the stoichiometric composition of the TiNi thin film deposited by ECR (Electron Cyclotron Resonance) sputtering method. In this research, the most significant factors in the factors of Ar gas flow rate, input power and Ni/Ti target area ratio are optimized by using the experimental design method, which can estimate priority factors from a comparatively small number of experiments are investigated. The chemical composition was measured by SEM-EDS and ESCA. The effect of the Ti/Ni target area ratio showed 88% of contributing rate for the chemical composition.
社団法人日本機械学会の論文
2006-09-15