Doping Effects of Group-III and -V Element on a-Si Prepared by High Pressure rf Sputtering : II-1: AMORPHOUS FILM PREPARATION AND CHARACTERIZATION (I)
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1980-06-01
著者
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SHIMIZU Tatsuo
Faculty of Engineering, Kanazawa University
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Kumeda Minoru
Faculty Of Technology
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Kumeda Minoru
Faculty Of Engineering Kanazawa University
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Shimizu Tatsuo
Faculty Of Technology
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Nakao Akira
Faculty Of Technology
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Suzuki Masakuni
Faculty Of Engineering Kanazawa University
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MAEKAWA Toshikazu
Faculty of Technology
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