Control of Ion Energy for Low-Damage Plasma Processing in RF Discharge

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1995-04-30

著者

• Kobayashi Hideki

  Department of Internal Medicine and Molecular Science, Graduate School of Medicine, Osaka University

• MASE Hiroshi

  Department of Electrical and Electronic Engineering, Ibaraki University

• Sato N

  Dept. Of Electronic Eng. Tohoku University

• Sato Naoyuki

  Department Of Electric And Electronic Engineering Ibazuki University

• IKEHATA Takashi

  Department of Electric and Electronic Engineering, Ibazuki University

• TANABE Toshio

  Department of Electric and Electronic Engineering, Ibazuki University

• Sato N

  Semiconductor Technology Development Group Semiconductor Solutions Network Company Sony Corporation

• Tanabe T

  Department Of Electronics And Electrical Engineering Faculty Of Science And Technologies Keio Univer

• Tanabe T

  Rhom Co. Ltd. Kyoto Jpn

• Tanabe Takaya

  Ntt Cyber Space Laboratories Ntt Corporation

• Mase H

  Ibaraki Univ. Hitachi Jpn

• Mase Hiroshi

  Department Of Electrical And Electronic Engineering Ibaraki University

• Tanabe T

  Department Of Electric And Electronic Engineering Ibazuki University

• Kobayashi Hideki

  Department Of Electrical And Electronic Engineering Ibaraki University Faculty Of Engineering

• Kobayashi Hideki

  Department Of Cardiology Tokyo Women's Medical College

• Kobayashi Hideki

  Department Of Cardiology Tokyo Metropolitan Fuchu Hospital

• MASE Hiroshi

  Department of Electric and Electronic Engineering, Ibazuki University

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