Large-Diameter Reactive Plasma Produced by a Plane Electron Cyclotron Resonance Antenna (<Special Issue> Plasma Processing)

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1994-07-30

著者

• ONO Takashi

  Department of Surgery, Akita University School of Medicine

• 中川 吉郎

  大阪市立大学

• Sato Noriyoshi

  Department of Electronic Engineering, Tohoku University

• Nakagawa Y

  Yamanashi Univ. Kofu Jpn

• Sato N

  Dept. Of Electronic Eng. Tohoku University

• Sato Naoyuki

  Department Of Electric And Electronic Engineering Ibazuki University

• IIZUKA Satoru

  Department of Electronic Engineering,Tohoku University

• 中川 吉郎

  大阪市立大・工

• NAKAGAWA Yukito

  Research and Development Division, ANELVA CORPORATION

• Sato N

  Semiconductor Technology Development Group Semiconductor Solutions Network Company Sony Corporation

• ISHIDA Takeshige

  Department of Electronic Engineering, Tohoku University

• Iizuka Satoru

  Department Of Electrical Engineering Graduate School Of Engineering Tohoku University

• Sato Noriyoshi

  Department Of Electrical Engineering Tohoku University

• Ishida Takeshige

  Department Of Electronic Engineering Tohoku University:semiconductor Equipment Division Kokusai Elec

• Ono Takashi

  Department Of Hospital Pharmacy & Pharmacology Asahikawa Medical College

• Ono Takashi

  Department Of Electronic Engineering Tohoku University

• Ono Takashi

  Department Of Biological Science And Technology Tokai University

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