Electron Cyclotron Resonance Devices with Permanent Magnets for Production of Large-Diameter Uniform Plasmas (<Special Issue> Plasma Processing)
スポンサーリンク
概要
- 論文の詳細を見る
A review is presented of experimental devices with permanent magnets for electron cyclotron resonance to produce large-diameter uniform plasmas. The devices are classified into 7 groups depending on device symmetry, magnet arrangement, plasma-drift direction and microwave coupling. Their characteristic points are clarified and the most optimal device construction and arrangement are discussed from a viewpoint of producing uniform plasmas necessary for large-scale plasma processing.
- 社団法人応用物理学会の論文
- 1994-07-30
著者
-
Sato Noriyoshi
Department of Electronic Engineering, Tohoku University
-
IIZUKA Satoru
Department of Electronic Engineering,Tohoku University
-
Iizuka Satoru
Department Of Electronic Engineering Tohoku University
-
Iizuka Satoru
Department Of Electrical Engineering Graduate School Of Engineering Tohoku University
-
Sato Noriyoshi
Department Of Electrical Engineering Tohoku University
関連論文
- Dispersion Relation of Drift-Wave Instability in a Collisionless Plasma with Sheared Magnetic Field
- Drift Motion of a Plasma in a Curved Magnetic Field with Rotational Transform
- Double Layer Dynamics in a Collisionless Magnetoplasma
- Stationary Double Layers in a Collisionless Magnetoplasma
- Electrostatic Potentials of Stationary Plasma Flows Along Magnetic Well and Hill
- A Mechanism for Potential-Driven Electrostatic Ion Cyclotron Oscillations in a Plasma
- Variation of Radial Plasma Density Profile with the Excitation Frequency in a Magnetron-Type Plasma
- Measurements of Power Absorption in a Modified Magnetron-type Discharge
- Production of a Large-Diameter Uniform Plasma by Modified Magnetron-Typed Radio Frequency Discharge
- Large-Diameter Reactive Plasma Produced by a Plane Electron Cyclotron Resonance Antenna ( Plasma Processing)
- Probe Measurements in a Negative Ion Plasma
- Plasma Potential Formation Due to Localized Radio-Frequency Electric Fields
- Analysis of Ion Species in Potassium-Fullerene Plasmas
- Electrostatic Ion-Cyclotron Oscillations Induced by an Emissive Disc Plate Floating in a Plasma
- Electron Injections from a Floated Plate into a Collisionless Plasma
- Plasma Particle Drifts Due to Traveling Waves with Cyclotron Frequencies
- Neutralized, Collisionless, Surface Ionized Ion Beam Source
- Optimum Condition for Spatial Ion Cyclotron Resonance in a Multiple Magnetic Mirror Field
- Pulling Effect of a Natural Low-Frequency Oscillation in a Gaseous Plasma by an Aprlied Signal
- Effects of Negative Ions and Magnetic Field on Potential Structures in RF Plasmas
- Low-Frequency Oscillations in a Weakly Ionized Plasma in Crossed Electric and Magnetic Fields
- Electron Cyclotron Resonance Devices with Permanent Magnets for Production of Large-Diameter Uniform Plasmas ( Plasma Processing)
- Formation of Nanoparticles by Control of Electron Temperature in Hollow-Typed Magnetron Radio Frequency CH4/H2 Plasma
- Spatial Evolution of Ion Beams Passing through a Multiple Magnetic Mirror Field
- Nonlinear Behaviors of a Bounded Electron Beam-Plasma System
- Buneman Instability in a Bounded Electron Beam-Plasma System
- Buneman Instability and Pierce Instability in a Collisionless Bounded Plasma
- Control of Radial Potential Profile by Biased Segmented Endplates in an ECR Plasma
- On the Positive Column in a Very Strong Magnetic Field
- Establishment and Functional Characterization of Novel Natural Killer Cell Lines Derived from a Temperature-Sensitive SV40 Large T Antigen Transgenic Mouse
- Potential-Driven Ion Cyclotron Oscillations in a Magnetized Collissionless Plasma
- Ionization of Buckminsterfullerene C_60 in a Noble Gas Plasma
- Excitation of Ion Waves in a Weakly Ionized Current-Carrying Plasma
- Low-Frequency Electrostatic Waves in a Weakly Ionized Plasma under a Weak Magnetic Field
- Ballistic Contributions to Ion Acoustic Waves in a Plasma
- External Excitation of Space Charge Waves in RF Discharges
- Evolutions of Plasma Potential Controlled by Biased Segmented Endplates
- Potential Formation Due to Contact between Floated Emissive Electrode and Plasma
- Production of a Large-Diameter Uniform Plasma by Modified Magnetron-Typed Radio Frequency Discharge
- Electron and Ion Energy Controls in a Radio Frequency Discharge Plasma with Silane
- Measurements of Power Absorption in a Modified Magnetron-type Discharge
- Sheath Structure for Positively-Charged Fine-Particle Levitation between Magnetized Double Plasmas
- MgO Microparticle Deposition by Radio Frequency Impulse Discharge in a Small-Diameter Tube
- Control of Electron Temperature by Varying DC Voltage to a Mesh Grid Blanketed with Thin Film in Plasmas
- Negative Hydrogen Ions Produced by Electron Temperature Control in an RF Plasma
- Measurements of Potential-Driven Electrostatic Ion Cyclotron Oscillations in a Plasma