Production of a Large-Diameter Uniform Plasma by Modified Magnetron-Typed Radio Frequency Discharge
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概要
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The properties of a new plasma source, i.e. a large-scale modified-magnetron typed (MMT) radio frequency (RF) plasma source, are investigated for producing a uniform high-density plasma with a large diameter of the order of 1 m. A plasma with uniformity within a few percent is produced over 120 cm in diameter in front of the substrate under an argon pressure of 1 mTorr. The plasma density is 6×1010 cm-3 at the axial center of the RF electrode when the incident RF power is 2.8 kW. The plasma density is almost proportional to the RF power. Since the structure of MMT plasma source is quite simple, it is useful for large area plasma processing.
- 1997-07-30
著者
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LI Yunlong
Department of Electronic Engineering, Tohoku University
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Iizuka Satoru
Department Of Electrical Engineering Graduate School Of Engineering Tohoku University
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Sato Noriyoshi
Department Of Electrical Engineering Tohoku University
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Iizuka Satoru
Department of Electronic Engineering, Tohoku University, Sendai 980-77, Japan
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Sato Noriyoshi
Department of Electronic Engineering, Tohoku University, Sendai 980-77, Japan
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Li Yunlong
Department of Electronic Engineering, Tohoku University, Sendai 980-77, Japan
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