Control of Radial Potential Profile by Biased Segmented Endplates in an ECR Plasma
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概要
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A radial potential profile is successfully changed flom hill- to well-shaped by bias-ing segmented endplates in a strongly magnetized plasma produced by the electron-cyclotron-resonance. The potential profile is settled down to hold the condition wherethere is no net electric current to the wall surrounding the plasma. There appears aradial electric current due to the non-ambipolar radial ton loss, balanced with an axialelectron current determined by the sheath potential drop in front of the endplates.The radial ion loss is observed to be remarkably enhanced by increasing the outwardradial electric field.
- 社団法人日本物理学会の論文
- 1991-08-15
著者
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Sato Noriyoshi
Department Of Electrical Engineering Tohoku University
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Tsushima Akira
Department Of Electronic Engineering Tohoku University
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