Potential Formation Due to Contact between Floated Emissive Electrode and Plasma
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概要
- 論文の詳細を見る
Potential formation due to contact between a floated emissive plane electrode andcollisionless plasma is investigated by means of particle simulations. When low-fern-perature high-density thermal electrons are emitted, a negative potential dip is createdin front of the electrode. With an increase in the emission flux from the electrode, theelectrode potential increases and finally becomes larger than the plasma potential.When a high-density electron beam is injected from the floated electrode, there ap-pears a stationary electron sheath in front of the electrode, which reflects most of theinjected electrons. This sheath also reflects ions flowing from the plasma toward theelectrode. When the beam density is low, such an electron sheath is not created. An in-termediate-density beam injection gives rise to a recurrence phenomenon and the elec-iron sheath structure appears periodically in time.potential formation, sheath, floated emissive electrode, simulation
- 社団法人日本物理学会の論文
- 1991-07-15
著者
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Ishiguro Seiji
Department Of Applied Chemistry School Of Science And Engineering Waseda University
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Sato Noriyoshi
Department Of Electrical Engineering Tohoku University
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Ishiguro Seiji
Department of Electronic Engineering,Tohoku University
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