Formation of Nanoparticles by Control of Electron Temperature in Hollow-Typed Magnetron Radio Frequency CH4/H2 Plasma
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概要
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In this study, we investigate the effects of electron temperature $T_{\text{e}}$ on the production of nanoparticles by using the grid-biasing method in hollow-typed magnetron radio frequency (RF) CH4/H2 plasma. We find that nanoparticles are produced in low-$T_{\text{e}}$ plasma. On the other hand, thin film depositions, such as nanowalls, are mainly observed and almost no nanoparticles are created in high-$T_{\text{e}}$ plasma. This implies that a reduction in the CH2/CH3 radical ratio is important for producing nanoparticles, together with a reduction in sheath potential in front of the substrate. The change in electron temperature in plasma has a marked effect on film quality.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2006-10-30
著者
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IIZUKA Satoru
Department of Electronic Engineering,Tohoku University
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Iizuka Satoru
Department Of Electrical Engineering Graduate School Of Engineering Tohoku University
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Emi Junichi
Department of Electrical Engineering, Graduate School of Engineering, Tohoku University, 6-6-05 Aoba
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Kato Kohgi
Sendai Digital Techno, 1-4-16 Niidera, Wakabayashi-ku, Sendai 984-0051, Japan
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Abe Toshimi
Tohoku Institute of Technology, 35-1 Kasumi-cho, Yagiyama, Taihaku-ku, Sendai 982-8577, Japan
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Kato Kohgi
Sendai Digital Techno
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Abe Toshimi
Tohoku Institute Of Technology
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Emi Junichi
Department Of Electrical Engineering Graduate School Of Engineering Tohoku University
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