Highty Conductive and Transparent Silicon Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1986-09-20
著者
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Sato Hisao
Nitride Semiconductor Co. Ltd.
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Sato H
Research And Development Center Gunze Limited
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MINAMI Tadatsugu
Electron Device System Laboratory, Kanazawa Institute of Technology
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TAKATA Shinzo
Electron Device System Laboratory, Kanazawa Institute of Technology
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SATO Hirotoshi
Electron Device System Laboratory, Kanazawa Institute of Technology
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NANTO Hidehito
Electron Device System Laboratory, Kanazawa Institute of Technology
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Takata Shinzo
Electron Device System Laboratory Kanazawa Institute Of Technology
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Nanto Hidehito
Electron Device System Laboratory Kanazawa Institute Of Technology
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Miyata Takeo
Electron Device System Laboratory Kanazawa Institute Of Technology
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Miyata T
Optoelectronic Device System R&d Center Kanazawa Institute Of Technology
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Minami Tadatsugu
Electron Device System Laboratory Kanazawa Institute Of Technology
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Sato Hisao
Department of Applied Physics, Graduate School of Engineering, Tohoku University
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