Takata Shinzo | Electron Device System Laboratory Kanazawa Institute Of Technology
スポンサーリンク
概要
関連著者
-
MINAMI Tadatsugu
Electron Device System Laboratory, Kanazawa Institute of Technology
-
TAKATA Shinzo
Electron Device System Laboratory, Kanazawa Institute of Technology
-
Takata Shinzo
Electron Device System Laboratory Kanazawa Institute Of Technology
-
Minami Tadatsugu
Electron Device System Laboratory Kanazawa Institute Of Technology
-
Miyata Takeo
Electron Device System Laboratory Kanazawa Institute Of Technology
-
Miyata T
Optoelectronic Device System R&d Center Kanazawa Institute Of Technology
-
高田 新三
金沢工業大学
-
Minami T
Department Of Applied Materials Science Graduate School Of Engineering Osaka Prefecture University
-
Sato Hisao
Nitride Semiconductor Co. Ltd.
-
Sato H
Research And Development Center Gunze Limited
-
SATO Hirotoshi
Electron Device System Laboratory, Kanazawa Institute of Technology
-
NANTO Hidehito
Electron Device System Laboratory, Kanazawa Institute of Technology
-
Nanto Hidehito
Electron Device System Laboratory Kanazawa Institute Of Technology
-
Sato Hisao
Department of Applied Physics, Graduate School of Engineering, Tohoku University
-
Sato Hiroyasu
Faculty Of Engineering Mie University
-
Sato Hiroharu
Multimedia Eng. Lab.
-
Sato H
Department Of Applied Chemistry Faculty Of Engineering Kumamoto University
-
MIYATA Toshihiro
Electron Device System Laboratory, Kanazawa Institute of Technology
-
Miyata Toshihiro
Electron Device System Laboratory Kanazawa Institute Of Technology
-
SONOHARA Hideo
Electron Device System Laboratory, Kanazawa Institute of Technology
-
Sunagawa Hiromi
Department Of Applied Physics Faculty Of Engineering Tohoku University
-
Kitamura K
Osaka Univ. Osaka Jpn
-
Sato H
Univ. Tokushima Tokushima Jpn
-
福田 一郎
Department Of Radiology The Jikei University School Of Medicine
-
SATO Hisano
Wireless Research Laboratory, Matsushita Elec. Ind., Co.
-
Fukuda Ichiro
Electron Device System Laboratory, Kanazawa Institute of Technology
-
Fukuda I
Tokyo Woman's Christian Univ.
-
Fukuda Ichirou
Department Of Radiology Jikei University School Of Medicine
-
Mouri Takashi
Chemical Laboratory Tosoh Corporation
-
OGAWA Norihiro
Chemical Laboratory, Tosoh Corporation
-
MIYATA Yoshihiro
Electron Device System Laboratory, Kanazawa Industry of Technology
-
IMAMOTO Hideyuki
Electron Device System Laboratory, Kanazawa Institute of Technology
-
Miyata Yoshihiro
Electron Device System Laboratory Kanazawa Industry Of Technology
-
Ogawa Norihiro
Chemical Laboratory Tosoh Corporation
-
Iwamoto Atsushi
Electron Device System Laboratory Kanazawa Institute Of Technology
-
KAKUMU Toshikazu
Electron Device System Laboratory, Kanazawa Institute of Technology
-
KITAMURA Kentaro
Electron Device System Laboratory, Kanazawa Institute of Technology
-
Kakumu Toshikazu
Electron Device System Laboratory Kanazawa Institute Of Technology
-
Imamoto Hideyuki
Electron Device System Laboratory Kanazawa Institute Of Technology
-
KITAMURA Kentarou
Electron Device System Laboratory, Kanazawa Institute of Technology
-
KOMANO Masakazu
Electron Device System Laboratory, Kanazawa Institute of Technology
-
MAENO Takanori
Electron Device System Laboratory, Kanazawa Institute of Technology
-
KUROI Yoshihiro
Electron Device System Laboratory, Kanazawa Institute of Technology
-
Maeno Takanori
Electron Device System Laboratory Kanazawa Institute Of Technology
-
Komano Masakazu
Electron Device System Laboratory Kanazawa Institute Of Technology
-
Kuroi Yoshihiro
Electron Device System Laboratory Kanazawa Institute Of Technology
著作論文
- High-Luminance Green-Emitting Thin-Film Electroluminescent Devices Using ZnGa_2O_4:Mn Phosphor
- Highly Transparent and Conductive Zinc-Stannate Thin Films Prepared by RF Magnetron Sputtering
- Transparent and Conductive ZnO Thin Films Prepared by Atmospheric-Pressure Chemical Vapor Deposition Using Zinc Acetylacetonate
- Large-Area Milky Transparent Conducting Al-Doped ZnO Films Prepared by Magnetron Sputtering
- Reactive Ion Etching Using Electron Cyclotron Resonance Hydrogen Plasma with n-Butyl Acetate Reactive Gas : Etching
- Reactive Ion Etching Using Electron Cyclotron Resonance Hydrogen Plasma with n-Butyl Acetate Reactive Gas
- Substrate Temperature Dependence of Transparent Conducting Al-Doped ZnO Thin Films Prepared by Magnetron Sputtering
- Highty Conductive and Transparent Silicon Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering
- Group III Impurity Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering
- Highly Conducting and Transparent SnO_2 Thin Films Prepared by RF Magnetron Sputtering on Low-Temperature Substrates : Surfaces, Interfaces and Films
- Highly Transparent and Conductive Zn_2In_2O_5 Thin Films Prepared by RF Magnetron Sputtering
- High-Luminance Green Zn_2SiO_4:Mn Thin-Film Electroluminescent Devices Using an Insulating BaTiO_3 Ceramic Sheet
- Flat Panel Light-Emitting Sounder Using Thin-Film EL Devices with a Ceramic Insulating Layer
- Reactive Ion Etching of Transparent Conducting Tin Oxide Films Using Electron Cyclotron Resonance Hydrogen Plasma : Nuclear Science, Plasmas and Electric Discharges
- Low Voltage Driven MOCVD-Grown ZnS:Mn Thin-Film Electroluminescent Devices Using Insulating BaTiO_3 Ceramic Sheets : Optical Properties of Condensed Matter
- High-Quality Zinc Sulfide Thin Films Grown by MOCVD Using Carbon Disulfide as A Sulfur Source : Semiconductors and Semiconductor Devices
- A New de Electroluminescent Device Using Sintered ZnS:Mn Phosphor-Ceramics
- Optical Properties of Aluminum Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering