NANTO Hidehito | Electron Device System Laboratory, Kanazawa Institute of Technology

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概要

• Nanto Hidehitoの詳細を見る
• 同名の論文著者
• Electron Device System Laboratory, Kanazawa Institute of Technologyの論文著者

関連著者

• MINAMI Tadatsugu

  Electron Device System Laboratory, Kanazawa Institute of Technology

• TAKATA Shinzo

  Electron Device System Laboratory, Kanazawa Institute of Technology

• NANTO Hidehito

  Electron Device System Laboratory, Kanazawa Institute of Technology

• Takata Shinzo

  Electron Device System Laboratory Kanazawa Institute Of Technology

• Nanto Hidehito

  Electron Device System Laboratory Kanazawa Institute Of Technology

• Miyata Takeo

  Electron Device System Laboratory Kanazawa Institute Of Technology

• Minami Tadatsugu

  Electron Device System Laboratory Kanazawa Institute Of Technology

• Miyata T

  Optoelectronic Device System R&d Center Kanazawa Institute Of Technology

• 高田 新三

  金沢工業大学

• MIYATA Toshihiro

  Electron Device System Laboratory, Kanazawa Institute of Technology

• Miyata Toshihiro

  Electron Device System Laboratory Kanazawa Institute Of Technology

• Sato Hisao

  Nitride Semiconductor Co. Ltd.

• Minami T

  Department Of Applied Materials Science Graduate School Of Engineering Osaka Prefecture University

• Sato H

  Research And Development Center Gunze Limited

• SATO Hirotoshi

  Electron Device System Laboratory, Kanazawa Institute of Technology

• Kitamura K

  Osaka Univ. Osaka Jpn

• Iwamoto Atsushi

  Electron Device System Laboratory Kanazawa Institute Of Technology

• KITAMURA Kentarou

  Electron Device System Laboratory, Kanazawa Institute of Technology

• KOMANO Masakazu

  Electron Device System Laboratory, Kanazawa Institute of Technology

• Komano Masakazu

  Electron Device System Laboratory Kanazawa Institute Of Technology

• Sato Hisao

  Department of Applied Physics, Graduate School of Engineering, Tohoku University

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著作論文

• Highty Conductive and Transparent Silicon Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering
• Group III Impurity Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering
• Highly Conducting and Transparent SnO_2 Thin Films Prepared by RF Magnetron Sputtering on Low-Temperature Substrates : Surfaces, Interfaces and Films
• Reactive Ion Etching of Transparent Conducting Tin Oxide Films Using Electron Cyclotron Resonance Hydrogen Plasma : Nuclear Science, Plasmas and Electric Discharges
• Low Voltage Driven MOCVD-Grown ZnS:Mn Thin-Film Electroluminescent Devices Using Insulating BaTiO_3 Ceramic Sheets : Optical Properties of Condensed Matter
• High-Quality Zinc Sulfide Thin Films Grown by MOCVD Using Carbon Disulfide as A Sulfur Source : Semiconductors and Semiconductor Devices
• A New de Electroluminescent Device Using Sintered ZnS:Mn Phosphor-Ceramics
• Optical Properties of Aluminum Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering

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